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| Title |
Effects of power on ion behaviors in radio-frequency magnetron sputtering of indium tin oxide (ITO)
|
|---|---|
| Published in |
Plasma Science and Technology, July 2024
|
| DOI | 10.1088/2058-6272/ad3599 |
| Authors |
LI Maoyang, MO Chaochao, CHEN Jiali, JI Peiyu, TAN Haiyun, Xiaoman ZHANG, CUI Meili, Lanjian ZHUGE, WU Xuemei, Tianyuan HUANG |