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An N2-compatible Ni0 Metal–Organic Chemical Vapor Deposition (MOCVD) Precursor

Overview of attention for article published in Chemistry Letters, June 2015
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Title
An N2-compatible Ni0 Metal–Organic Chemical Vapor Deposition (MOCVD) Precursor
Published in
Chemistry Letters, June 2015
DOI 10.1246/cl.150155
Authors

Viet-Ha Tran, Takeshi Yatabe, Takahiro Matsumoto, Hidetaka Nakai, Kazuharu Suzuki, Takao Enomoto, Seiji Ogo

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X Demographics

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Mendeley readers

Mendeley readers

The data shown below were compiled from readership statistics for 3 Mendeley readers of this research output. Click here to see the associated Mendeley record.

Geographical breakdown

Country Count As %
Unknown 3 100%

Demographic breakdown

Readers by professional status Count As %
Student > Ph. D. Student 2 67%
Unknown 1 33%
Readers by discipline Count As %
Chemistry 2 67%
Unknown 1 33%