Ion Implantation: Equipment and Techniques
Springer Berlin Heidelberg
Chapter title |
Electron-Beam-Induced Recoil Implantation in Semiconductors at 300 K
|
---|---|
Chapter number | 26 |
Book title |
Ion Implantation: Equipment and Techniques
|
Published by |
Springer, Berlin, Heidelberg, January 1983
|
DOI | 10.1007/978-3-642-69156-0_26 |
Book ISBNs |
978-3-64-269158-4, 978-3-64-269156-0
|
Authors |
T. Wada, K. Nakai, H. Hada, Wada, T., Nakai, K., Hada, H. |
Country | Count | As % |
---|---|---|
Unknown | 1 | 100% |
Readers by professional status | Count | As % |
---|---|---|
Professor | 1 | 100% |
Readers by discipline | Count | As % |
---|---|---|
Physics and Astronomy | 1 | 100% |