Ion Implantation: Equipment and Techniques
Springer Berlin Heidelberg
Chapter title |
Rapid Isothermal Annealing for Semiconductor Applications: Aspects of Equipment Design
|
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Chapter number | 59 |
Book title |
Ion Implantation: Equipment and Techniques
|
Published by |
Springer, Berlin, Heidelberg, January 1983
|
DOI | 10.1007/978-3-642-69156-0_59 |
Book ISBNs |
978-3-64-269158-4, 978-3-64-269156-0
|
Authors |
C. J. Russo, D. F. Downey, S. C. Holden, R. T. Fulks, Russo, C. J., Downey, D. F., Holden, S. C., Fulks, R. T. |
Country | Count | As % |
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Unknown | 1 | 100% |
Readers by professional status | Count | As % |
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Student > Ph. D. Student | 1 | 100% |
Readers by discipline | Count | As % |
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Engineering | 1 | 100% |