Characterization of Interface and Bulk Traps in Ultrathin Atomic Layer-Deposited Oxide Semiconductor MOS Capacitors With HfO2/In2O3 Gate Stack by C-V and Conductance Method

Overview of attention for article published in Frontiers in Materials, May 2022

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Article in Micromachines (August 2023)

Article in International Journal of Extreme Manufacturing (February 2023)

Article in IEEE Electron Device Letters (January 2023)

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