Reaction mechanism of atomic layer deposition of zirconium oxide using zirconium precursors bearing amino ligands and water

Overview of attention for article published in Frontiers in Chemistry, November 2022

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New Research: Reaction mechanism of atomic layer deposition of zirconium oxide using zirconium precursors bearing amino ligands and water: As a unique nanofabrication technology, atomic layer deposition (ALD) has been widely used for the… https://t.co/giB2

04 Nov 2022

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Reaction mechanism of atomic layer deposition of zirconium oxide using zirconium precursors bearing amino ligands and water https://t.co/iD5tcShpSM

04 Nov 2022

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